Spin-pinnoitin
Photoresist Processing Equipment
Coating Spinner for Nanofilm Application
Photolithography & Thin Polymer Film Application
Uniform Spin Coating Thin Film Application

Tuotekuvaus:

Qualtechin tuotteet teollisuudessa Spin-pinnoitin on ammattilainen Polymer Film Application Equipment to apply a uniform thin film or ultra-thin polymer film on sample surfaces and substrates including wafers.

Spin Coating is the application of a small amount of liquid sample at the center of the sample or substrate, e.g. wafer. Initially when adding the liquid sample the wafer is usually not in motion or it is spinning at a very low speed. After the liquid sample has been added on the wafer the spinning speed increases to a very high level to help spread the liquid sample automatically from the center of the wafer across the whole surface of the wafer to create a uniform coating.

The thickness of the applied coating is dependent on a variety of factors including:

• the viscosity of the liquid sample,
• the concentration of the liquid sample,
• the spinning speed of the wafer.

This professional Spin Coater is designed and engineered offering the newest microchip technology combined with a large Touchscreen Display with Backlight, a High-Precision Vacuum System, a precision High Performance Motor, High Speed Acceleration, Continuous Speed Control, advanced Precision Sensors, integrated Safety Features, Fully Automatic Program Controlled with user-friendly programming, user-friendly Sample Handling, a Continuous Speed Control, high accuracy and high precision, an ergonomic design, reliable performance, longevity and much more.

Tämä edistyksellinen Spin Coating Equipment is recommended for a wide range of substrates including silicon wafers, ceramic wafers, glass panels and related substrates and it is widely used to create thin films and ultrathin films within the Nanoscale Thickness including photolithography.

This professional Spin Coater is designed and engineered in accordance with international test standards.